Invention Grant
US07863624B2 Silicon carbide on diamond substrates and related devices and methods
有权
金刚石基底上的碳化硅及相关器件及方法
- Patent Title: Silicon carbide on diamond substrates and related devices and methods
- Patent Title (中): 金刚石基底上的碳化硅及相关器件及方法
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Application No.: US12504725Application Date: 2009-07-17
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Publication No.: US07863624B2Publication Date: 2011-01-04
- Inventor: Adam William Saxler
- Applicant: Adam William Saxler
- Applicant Address: US NC Durham
- Assignee: Cree, Inc.
- Current Assignee: Cree, Inc.
- Current Assignee Address: US NC Durham
- Agency: Withrow & Terranova, P.L.L.C.
- Main IPC: H01L29/778
- IPC: H01L29/778

Abstract:
A high power, wide-bandgap device is disclosed that exhibits reduced junction temperature and higher power density during operation and improved reliability at a rated power density. The device includes a diamond substrate for providing a heat sink with a thermal conductivity greater than silicon carbide, a single crystal silicon carbide layer on the diamond substrate for providing a supporting crystal lattice match for wide-bandgap material structures that is better than the crystal lattice match of diamond, and a Group III nitride heterostructure on the single crystal silicon carbide layer for providing device characteristics.
Public/Granted literature
- US20090272984A1 Silicon Carbide on Diamond Substrates and Related Devices and Methods Public/Granted day:2009-11-05
Information query
IPC分类: