Invention Grant
- Patent Title: Hybrid electrical contact
- Patent Title (中): 混合电接触
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Application No.: US11400348Application Date: 2006-04-07
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Publication No.: US07863663B2Publication Date: 2011-01-04
- Inventor: Jonathan Doebler
- Applicant: Jonathan Doebler
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Fletcher Yoder
- Main IPC: H01L27/108
- IPC: H01L27/108

Abstract:
Techniques for manufacturing an electronic device. In certain embodiments, a substrate includes a lower patterned layer that has a target conductor. A hybrid-vertical contact may be disposed directly on the target conductor. The hybrid vertical contact may include a lower-vertical contact directly on the target conductor and an upper-vertical contact directly on the lower-vertical contact. The upper-vertical contact may have an upper width that is greater than a lower width of the lower-vertical contact.
Public/Granted literature
- US20070235789A1 Hybrid electrical contact Public/Granted day:2007-10-11
Information query
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