Invention Grant
- Patent Title: Insulated-gate field-effect transistor
- Patent Title (中): 绝缘栅场效应晶体管
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Application No.: US12477518Application Date: 2009-06-03
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Publication No.: US07863678B2Publication Date: 2011-01-04
- Inventor: Ryoji Takahashi
- Applicant: Ryoji Takahashi
- Applicant Address: JP
- Assignee: Sanken Electric Co., Ltd.
- Current Assignee: Sanken Electric Co., Ltd.
- Current Assignee Address: JP
- Agency: Woodcock Washburn LLP
- Priority: JP2006-326811 20061204
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94 ; H01L31/062 ; H01L31/113 ; H01L31/119

Abstract:
An IGFET that can be turned off when a reverse voltage is applied. Included is a semiconductor substrate having formed therein an n-type drain region, p-type first body region, p−-type second body region, n-type first source region, and n+-type second source region. Trenches etched in the substrate receive gate electrodes via gate insulators. The source electrode is in ohmic contact with both first and second source regions and in schottky barrier contact with the second body region.
Public/Granted literature
- US20090236660A1 Insulated-Gate Field-Effect Transistor and Method of Making the Same Public/Granted day:2009-09-24
Information query
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