Invention Grant
- Patent Title: Trench MOSFET with embedded junction barrier Schottky diode
- Patent Title (中): 沟槽MOSFET具有嵌入式结屏势肖特基二极管
-
Application No.: US12156070Application Date: 2008-05-28
-
Publication No.: US07863685B2Publication Date: 2011-01-04
- Inventor: Fwu-Iuan Hshieh
- Applicant: Fwu-Iuan Hshieh
- Applicant Address: TW
- Assignee: Force-MOS Technology Corp.
- Current Assignee: Force-MOS Technology Corp.
- Current Assignee Address: TW
- Agent Bo-In Lin
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
A trenched semiconductor power device that includes a plurality of trenched gates surrounded by source regions near a top surface of a semiconductor substrate encompassed in body regions. Each of the body regions extended between two adjacent trenched gates further having a gap exposing a top surface above an epitaxial layer above said semiconductor substrate. The trenched semiconductor power device further includes a Schottky junction barrier layer covering the top surface above the epitaxial layer between the trenched gate thus forming embedded Schottky diodes between adjacent trenched gates.
Public/Granted literature
- US20090294859A1 Trench MOSFET with embedded junction barrier Schottky diode Public/Granted day:2009-12-03
Information query
IPC分类: