Invention Grant
- Patent Title: Thin film transistor and method of manufacturing the same
- Patent Title (中): 薄膜晶体管及其制造方法
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Application No.: US12174522Application Date: 2008-07-16
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Publication No.: US07864257B2Publication Date: 2011-01-04
- Inventor: Jong-Moo Huh , Joon-Hoo Choi , Seung-Kyu Park
- Applicant: Jong-Moo Huh , Joon-Hoo Choi , Seung-Kyu Park
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Innovation Counsel LLP
- Priority: KR10-2007-136827 20071224
- Main IPC: G02F1/136
- IPC: G02F1/136 ; H01L31/00

Abstract:
A thin film transistor and a method of manufacturing the thin film transistor is disclosed. The thin film transistor includes first and second ohmic contact layers, an activation layer, an insulating layer, a source electrode formed on the insulating layer and connected to the first ohmic contact layer through first contact hole, a drain electrode formed on the insulating layer and connected to the second ohmic contact layer through second contact hole, a gate electrode formed on the insulating layer between the source electrode and the drain electrode and overlapping the activation layer, and a protective layer formed on the source electrode, the drain electrode, and the gate electrode.
Public/Granted literature
- US20090159887A1 THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2009-06-25
Information query
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