Invention Grant
US07864293B2 Exposure apparatus, exposure method, and producing method of microdevice
有权
曝光装置，曝光方法及微型装置的制作方法
- Patent Title: Exposure apparatus, exposure method, and producing method of microdevice
- Patent Title (中): 曝光装置，曝光方法及微型装置的制作方法
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Application No.: US11661297Application Date: 2006-01-24
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Publication No.: US07864293B2Publication Date: 2011-01-04
- Inventor: Masaki Kato , Kenji Shimizu , Manabu Toguchi , Tomoyuki Watanabe
- Applicant: Masaki Kato , Kenji Shimizu , Manabu Toguchi , Tomoyuki Watanabe
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2005-016843 20050125; JP2005-043103 20050218; JP2005-236940 20050817
- International Application: PCT/JP2006/301001 WO 20060124
- International Announcement: WO2006/080285 WO 20060803
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
An exposure apparatus for exposure-transferring an image of a pattern projected through an optical system having a plurality of optical units L1 to L13 onto an object P, comprises a correcting device which corrects a position of at least one of a plurality of images to be projected onto the object P by the plurality of optical units L1 to L13 so that displacements of the optical units L1 to L13 are compensated.
Public/Granted literature
- US20070296936A1 Exposure Apparatus, Exposure Method, and Producing Method of Microdevice Public/Granted day:2007-12-27
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