Invention Grant
- Patent Title: Positioning apparatus, exposure apparatus, and device manufacturing method
- Patent Title (中): 定位装置,曝光装置和装置制造方法
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Application No.: US12182433Application Date: 2008-07-30
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Publication No.: US07864337B2Publication Date: 2011-01-04
- Inventor: Tadayasu Nishikawa
- Applicant: Tadayasu Nishikawa
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi Kimms & McDowell LLP
- Priority: JP2007-204573 20070806
- Main IPC: G01B11/02
- IPC: G01B11/02

Abstract:
A positioning apparatus comprises a first measuring device measuring a position of the stage in a first measuring range, a second measuring device measuring a position of the stage in a second measuring range having an overlapping range overlapping the first measuring range, a third measuring device measuring a position of the stage in the overlapping range, and a controller controlling the first measuring device to take over the measurement value obtained by the second measuring device in the overlapping range in moving the stage from the second measuring range to the first measuring range, thereby switching from measurement by the second measuring device to measurement by the first measuring device. The controller performs correction processing based on the measurement by the third measuring device so as to reduce an error of the measurement value obtained by the first measuring device after the switching.
Public/Granted literature
- US20090040528A1 POSITIONING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-02-12
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