Invention Grant
US07864337B2 Positioning apparatus, exposure apparatus, and device manufacturing method 有权
定位装置,曝光装置和装置制造方法

Positioning apparatus, exposure apparatus, and device manufacturing method
Abstract:
A positioning apparatus comprises a first measuring device measuring a position of the stage in a first measuring range, a second measuring device measuring a position of the stage in a second measuring range having an overlapping range overlapping the first measuring range, a third measuring device measuring a position of the stage in the overlapping range, and a controller controlling the first measuring device to take over the measurement value obtained by the second measuring device in the overlapping range in moving the stage from the second measuring range to the first measuring range, thereby switching from measurement by the second measuring device to measurement by the first measuring device. The controller performs correction processing based on the measurement by the third measuring device so as to reduce an error of the measurement value obtained by the first measuring device after the switching.
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