Invention Grant
- Patent Title: Method and system for measuring patterned structures
- Patent Title (中): 用于测量图案结构的方法和系统
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Application No.: US12624555Application Date: 2009-11-24
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Publication No.: US07864343B2Publication Date: 2011-01-04
- Inventor: Moshe Finarov , Boaz Brill
- Applicant: Moshe Finarov , Boaz Brill
- Applicant Address: IL Rehovot
- Assignee: Nova Measuring Instruments Ltd.
- Current Assignee: Nova Measuring Instruments Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Browdy and Neimark, PLLC
- Priority: IL130874 19990709
- Main IPC: G01B11/14
- IPC: G01B11/14
Abstract:
A method of preparation of reference data for measuring the profile of a patterned structure for use in control of a manufacturing process, the method including: providing a model for generating profiles based on the manufacturing process; generating the profiles by simulation of the manufacturing process; and preparing diffraction signal reference data corresponding to the generated profiles.
Public/Granted literature
- US20100121627A1 METHOD AND SYSTEM FOR MEASURING PATTERNED STRUCTURES Public/Granted day:2010-05-13
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