Invention Grant
- Patent Title: Fabrication method for quasi-phase-matched waveguides
- Patent Title (中): 准相位匹配波导的制作方法
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Application No.: US11861447Application Date: 2007-09-26
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Publication No.: US07864409B2Publication Date: 2011-01-04
- Inventor: Woo Seok Yang , Han Young Lee , Hyung Man Lee , Woo Kyung Kim , Soon Sup Park
- Applicant: Woo Seok Yang , Han Young Lee , Hyung Man Lee , Woo Kyung Kim , Soon Sup Park
- Applicant Address: KR
- Assignee: Korea Electronics Technology Institute
- Current Assignee: Korea Electronics Technology Institute
- Current Assignee Address: KR
- Agency: Thomas, Kayden, Horstemeyer & Risley, LLP
- Priority: KR10-2006-0099615 20061013
- Main IPC: G02F1/35
- IPC: G02F1/35 ; G02F2/02

Abstract:
The present invention relates to a fabrication method for a quasi-phase-matched waveguide. The method includes the steps of forming a metal etch mask on a ferroelectric single crystal substrate, etching the substrate by using the etch mask, removing the etch mask, forming conductive layers on the etched substrate, forming polarization regions by applying an electric field to the conductive layers, and flattening the substrate after removing the conductive layers. Accordingly, the present invention is advantageous in that it can be applied to various fields employing a ferroelectric substrate, such as LiNbO3, LiTaO3, Mg:LiNbO3 or Zn:LiNbO3, it can obtain more accurate and uniform periodic domain inversion devices with a high quality and can fabricate devices that are cheaper and have a better performance.
Public/Granted literature
- US20080087632A1 Fabrication Method for Quasi-Phase-Matched Waveguides Public/Granted day:2008-04-17
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