Invention Grant
US07864555B2 Production method for semiconductor storage device and semiconductor storage device 有权
半导体存储装置及半导体存储装置的制造方法

Production method for semiconductor storage device and semiconductor storage device
Abstract:
A pair of power supply lines that are orthogonal to the border with the cell array are placed, for each one-bit processing circuit of the data processing unit, in a semiconductor storage device such as SRAM or the like comprising a data processing unit for writing data to memory cells and reading it therefrom, a row decode unit for driving the word lines of the memory cells, and a timing control unit for generating a control pulse for the data processing unit, all of which are arranged around the circumference of a cell array in which memory cells are arrayed in a grid-like fashion. MOS transistors are placed between the power supply lines in such a position that the principal axis direction of the gate pattern is orthogonal to the two aforementioned wirings, and are closely arrayed in the longitudinal direction of the power supply lines.
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