Invention Grant
- Patent Title: Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
- Patent Title (中): 清洁装置，光刻设备和光刻设备清洁方法
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Application No.: US12081171Application Date: 2008-04-11
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Publication No.: US07866330B2Publication Date: 2011-01-11
- Inventor: Bauke Jansen , Raymond Gerardus Marius Beeren , Anthonius Martinus Cornelis Petrus De Jong , Kornelis Tijmen Hoekerd
- Applicant: Bauke Jansen , Raymond Gerardus Marius Beeren , Anthonius Martinus Cornelis Petrus De Jong , Kornelis Tijmen Hoekerd
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthdrop Shaw Pittman LLP
- Main IPC: B08B3/10
- IPC: B08B3/10
Abstract:
A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.
Public/Granted literature
- US20090015805A1 Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method Public/Granted day:2009-01-15
Information query
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