- Patent Title: Process for the modification of substrate surfaces through the deposition of amorphous silicon layers followed by surface functionalization with organic molecules and functionalized structures
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Application No.: US11302309Application Date: 2005-12-13
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Publication No.: US07867627B2Publication Date: 2011-01-11
- Inventor: David A. Smith , Gary A. Barone , Martin E. Higgins
- Applicant: David A. Smith , Gary A. Barone , Martin E. Higgins
- Applicant Address: US PA Bellefonte
- Assignee: Silcotek Corporation
- Current Assignee: Silcotek Corporation
- Current Assignee Address: US PA Bellefonte
- Agency: Harding, Earley, Follmer & Frailey, P.C.
- Agent John F. A. Earley, III; Frank J. Bonini, Jr.
- Main IPC: B32B15/01
- IPC: B32B15/01
Abstract:
Functionalized substrates and method of passivating the surface of a substrate to improve the surface by imparting desirable surface properties to improve the performance of a surface, the method steps including exposing the substrate to a chemical vapor deposition process to coat the substrate with silicon, and functionalizing the coated surface by exposing the substrate surface to a binding reagent having at least one unsaturated hydrocarbon group.
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