Invention Grant
US07867695B2 Methods for mastering microstructures through a substrate using negative photoresist
有权
通过使用负性光致抗蚀剂的底物来掌握微结构的方法
- Patent Title: Methods for mastering microstructures through a substrate using negative photoresist
- Patent Title (中): 通过使用负性光致抗蚀剂的底物来掌握微结构的方法
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Application No.: US10661917Application Date: 2003-09-11
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Publication No.: US07867695B2Publication Date: 2011-01-11
- Inventor: Robert P. Freese , Thomas A. Rinehart , Robert L. Wood
- Applicant: Robert P. Freese , Thomas A. Rinehart , Robert L. Wood
- Applicant Address: US VA Richmond
- Assignee: Bright View Technologies Corporation
- Current Assignee: Bright View Technologies Corporation
- Current Assignee Address: US VA Richmond
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Main IPC: G02B27/72
- IPC: G02B27/72
Abstract:
Microstructures are fabricated by impinging a radiation beam, such as a laser beam, through a substrate that is transparent to the laser beam, into a negative photoresist layer on the substrate. The negative photoresist layer may be subsequently developed to provide a master for optical and/or mechanical microstructures. Related systems, microstructure products and microstructure masters also are disclosed.
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