Invention Grant
- Patent Title: Reticle system for manufacturing integrated circuit systems
- Patent Title (中): 用于制造集成电路系统的标线系统
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Application No.: US12122866Application Date: 2008-05-19
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Publication No.: US07867698B2Publication Date: 2011-01-11
- Inventor: Gek Soon Chua , Sia Kim Tan , Byoung-IL Choi , Ryan Chong , Martin Yeo
- Applicant: Gek Soon Chua , Sia Kim Tan , Byoung-IL Choi , Ryan Chong , Martin Yeo
- Applicant Address: SG Singapore
- Assignee: Chartered Semiconductor Manufacturing Ltd.
- Current Assignee: Chartered Semiconductor Manufacturing Ltd.
- Current Assignee Address: SG Singapore
- Agent Mikio Ishimaru
- Main IPC: G03C5/00
- IPC: G03C5/00
Abstract:
A reticle system that includes: providing a reticle system; and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by grouping and pairing each of the image pattern onto the reticle system according to a multi-layer reticle grouping/pairing flow.
Public/Granted literature
- US20090284721A1 RETICLE SYSTEM FOR MANUFACTURING INTEGRATED CIRCUIT SYSTEMS Public/Granted day:2009-11-19
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