Invention Grant
- Patent Title: Absorber layer candidates and techniques for application
- Patent Title (中): 吸收层候选和应用技术
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Application No.: US11681343Application Date: 2007-03-02
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Publication No.: US07867868B2Publication Date: 2011-01-11
- Inventor: Joseph M. Ranish , Bruce E. Adams
- Applicant: Joseph M. Ranish , Bruce E. Adams
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: H01L21/336
- IPC: H01L21/336
Abstract:
The present invention generally provides an absorber layer using carbon based materials with increased and stabled thermal absorption coefficient and economical methods to produce such an absorber layer. One embodiment of the present invention provides a method for processing a substrate comprising depositing an absorber layer on a top surface of the substrate, wherein the substrate is maintained under a first temperature, annealing the substrate in a thermal processing chamber, wherein the substrate is heated to a second temperature, and the second temperature is higher than the first temperature, and removing the absorber layer from the substrate.
Public/Granted literature
- US20080214014A1 ABSORBER LAYER CANDIDATES AND TECHNIQUES FOR APPLICATION Public/Granted day:2008-09-04
Information query
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