Invention Grant
US07868427B2 Structure and method for placement, sizing and shaping of dummy structures
有权
虚拟结构的放置,尺寸和成形的结构和方法
- Patent Title: Structure and method for placement, sizing and shaping of dummy structures
- Patent Title (中): 虚拟结构的放置,尺寸和成形的结构和方法
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Application No.: US12353193Application Date: 2009-01-13
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Publication No.: US07868427B2Publication Date: 2011-01-11
- Inventor: Sebastian Schmidt , Hang-Yip Liu , Thomas Schafbauer , Yayi Wei
- Applicant: Sebastian Schmidt , Hang-Yip Liu , Thomas Schafbauer , Yayi Wei
- Applicant Address: DE Munich
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Munich
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L21/76
- IPC: H01L21/76 ; H01L21/4763 ; H01L21/302 ; H01L23/544

Abstract:
A material layer on a substrate being processed, e.g. to form chips, includes one or more functional structures. In order to control pattern density during fabrication of the chip, dummy fill structures of different sizes and shapes are added to the chip at different distances from the functional structures of the material layer. In particular, the placement, size and shape of the dummy structures are determined as a function of a distance to, and density of, the functional structures of the material layer.
Public/Granted literature
- US20090124027A1 Structure and Method for Placement, Sizing and Shaping of Dummy Structures Public/Granted day:2009-05-14
Information query
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