Invention Grant
- Patent Title: RF matching network of a vacuum processing chamber and corresponding configuration methods
- Patent Title (中): RF匹配网络的真空处理室和相应的配置方法
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Application No.: US11350022Application Date: 2006-02-08
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Publication No.: US07868556B2Publication Date: 2011-01-11
- Inventor: Yaomin Xia
- Applicant: Yaomin Xia
- Applicant Address: KY George Town, Grand Cayman
- Assignee: Advanced Micro-Fabrication Equipment, Inc. Asia
- Current Assignee: Advanced Micro-Fabrication Equipment, Inc. Asia
- Current Assignee Address: KY George Town, Grand Cayman
- Agency: Nixon Peabody, LLP.
- Agent Joseph Bach, Esq.
- Priority: CN200510028564 20050805
- Main IPC: H05B31/26
- IPC: H05B31/26

Abstract:
A RF matching network is described, and which includes a 1st to nth RF generators, and wherein each RF generator has a different frequency, and wherein the frequencies of the 1st to the nth RF input ports decline in sequence, and wherein between the ith frequency RF input port, and the output port is a ith circuit, which has a high impedance at the output port to all RF generator frequencies other than the ith frequency; and wherein the ith circuit, when connected to a RF generator with the ith frequency, and wherein measuring from the output port to the ith circuit, the ith circuit has a first impedance at the ith frequency; and when measuring from the output port in the opposite direction to the ith circuit, the ith circuit has a second impedance at the ith frequency; and wherein the first impedance is a substantial conjugate match of the second impedance.
Public/Granted literature
- US20070030091A1 RF matching network of a vacuum processing chamber and corresponding configuration methods Public/Granted day:2007-02-08
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