Invention Grant
US07868708B2 Method and apparatus for making a highly uniform low-stress single crystal by drawing from a melt and uses of said crystal
失效
通过从熔体中拉伸并使用所述晶体来制造高度均匀的低应力单晶的方法和装置
- Patent Title: Method and apparatus for making a highly uniform low-stress single crystal by drawing from a melt and uses of said crystal
- Patent Title (中): 通过从熔体中拉伸并使用所述晶体来制造高度均匀的低应力单晶的方法和装置
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Application No.: US12328879Application Date: 2008-12-05
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Publication No.: US07868708B2Publication Date: 2011-01-11
- Inventor: Gunther Wehrhan , Lutz Parthier , Daniel Rytz , Klaus Dupre , Lothar Ackermann
- Applicant: Gunther Wehrhan , Lutz Parthier , Daniel Rytz , Klaus Dupre , Lothar Ackermann
- Applicant Address: DE Mainz
- Assignee: Schott AG
- Current Assignee: Schott AG
- Current Assignee Address: DE Mainz
- Agent Michael J. Striker
- Priority: DE102005043623 20050913
- Main IPC: H03B5/00
- IPC: H03B5/00 ; H03B7/06

Abstract:
The method of making uniform low-stress crystals includes immersing a seed crystal held at a temperature under its melting point in a melt in a crucible and drawing it from the melt. The crystal and/or melt are rotated relative to each other and a planar phase boundary surface is maintained between them by detecting a surface temperature of the melt and/or crystal and controlling temperature fluctuations by increasing or decreasing the rotation speed. The single crystals obtained by this method have a diameter ≧50 mm and no visible growth strips in a fishtail pattern when a 2-mm thick sample is observed between crossed polarizers. These crystals have an index of refraction uniformity Δn of
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