Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method with reticle gripper
- Patent Title (中): 平版印刷设备及装置制造方法
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Application No.: US11484855Application Date: 2006-07-12
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Publication No.: US07869003B2Publication Date: 2011-01-11
- Inventor: Matthew J. Van Doren , Jonathan H. Feroce
- Applicant: Matthew J. Van Doren , Jonathan H. Feroce
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding NV
- Current Assignee: ASML Holding NV
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/62
- IPC: G03B27/62
Abstract:
A reticle gripper to hold a reticle of a lithographic apparatus is presented. The reticle gripper includes three gripper structures to contact the surface of the reticle. Each of the three gripper structures determines a position with respect to the reticle gripper of one of the points on the surface of the reticle.
Public/Granted literature
- US20080014508A1 Lithographic apparatus and device manufacturing method Public/Granted day:2008-01-17
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