Invention Grant
US07869025B2 Optical inspection method and optical inspection system 有权
光学检测方法和光学检测系统

Optical inspection method and optical inspection system
Abstract:
An optical semiconductor wafer inspection system and a method thereof are provided for classifying and inspecting defects such as scratches, voids and particles produced in a flattening process by a polishing or grinding technique used for semiconductor manufacturing. The present invention is an optical semiconductor wafer inspection system and a method thereof characterized by obliquely illuminating a scratch, void or particle produced on the surface of a polished or ground insulating film at substantially the same velocity of light, detecting scattered light at the time of oblique illumination from the surface of an inspection target at different angles and thereby classifying the scratch, void or particle.
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