Invention Grant
- Patent Title: Optical inspection method and optical inspection system
- Patent Title (中): 光学检测方法和光学检测系统
-
Application No.: US12163137Application Date: 2008-06-27
-
Publication No.: US07869025B2Publication Date: 2011-01-11
- Inventor: Hideki Soeda , Masayuki Ochi
- Applicant: Hideki Soeda , Masayuki Ochi
- Applicant Address: JP Tokyo
- Assignee: Hitachi-High-Technologies Corporation
- Current Assignee: Hitachi-High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2007-170682 20070628; JP2008-006772 20080116
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
An optical semiconductor wafer inspection system and a method thereof are provided for classifying and inspecting defects such as scratches, voids and particles produced in a flattening process by a polishing or grinding technique used for semiconductor manufacturing. The present invention is an optical semiconductor wafer inspection system and a method thereof characterized by obliquely illuminating a scratch, void or particle produced on the surface of a polished or ground insulating film at substantially the same velocity of light, detecting scattered light at the time of oblique illumination from the surface of an inspection target at different angles and thereby classifying the scratch, void or particle.
Public/Granted literature
- US20090002688A1 OPTICAL INSPECTION METHOD AND OPTICAL INSPECTION SYSTEM Public/Granted day:2009-01-01
Information query