Invention Grant
- Patent Title: Nonvolatile memory device and method for fabricating the same
- Patent Title (中): 非易失性存储器件及其制造方法
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Application No.: US12695390Application Date: 2010-01-28
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Publication No.: US07869278B2Publication Date: 2011-01-11
- Inventor: Byong-Kook Kim
- Applicant: Byong-Kook Kim
- Applicant Address: KR
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR
- Agency: Blakely, Sokoloff, Taylor & Zafman
- Priority: KR2006-0134271 20061227; KR2007-0027153 20070320
- Main IPC: G11C16/04
- IPC: G11C16/04

Abstract:
A nonvolatile memory device includes a plurality of strings each of which is configured with a first select transistor, a second select transistor, and a plurality of memory cells connected in series between the first and second select transistors. A common source line is connected to a source of the second select transistor. A metal interconnection is electrically insulated from the common source line, and connected to the source of the second select transistor.
Public/Granted literature
- US20100128533A1 NONVOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2010-05-27
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