Invention Grant
- Patent Title: Diagnosis and calibration system for ICP-MS apparatus
- Patent Title (中): ICP-MS设备诊断与校准系统
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Application No.: US11903912Application Date: 2007-09-25
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Publication No.: US07869968B2Publication Date: 2011-01-11
- Inventor: Kenichi Sakata , Tatsuya Shibukawa
- Applicant: Kenichi Sakata , Tatsuya Shibukawa
- Applicant Address: US CA Santa Clara
- Assignee: Agilent Technologies, Inc.
- Current Assignee: Agilent Technologies, Inc.
- Current Assignee Address: US CA Santa Clara
- Priority: JP2006-295462 20061031
- Main IPC: G01D18/00
- IPC: G01D18/00

Abstract:
A diagnostic system designed such that an aggregate of parameter combinations is stored, which is an aggregate of combinations of parameters consisting of a first parameter for determining the output of the high-frequency power source, a second parameter for determining the flow rate of the carrier gas in the aerosol, and a third parameter for determining the distance between the plasma torch and the interface, and which forms a specific array such that the measurement points corresponding to the respective combinations are lined up in order along the direction of length of an envelope that forms the end on the high-sensitivity side of a graph drawn as an aggregate of all measurement points on a sensitivity-oxide ion ratio graph, and a diagnostic measurement is performed with a specific diagnostic sample using the parameter value of each combination of the above-mentioned parameter combinations that form the aggregate such that the device properties can be confirmed from the position on the envelope on the sensitivity-oxide ion ratio graph of the actual measurement points corresponding to each combination.
Public/Granted literature
- US20080099671A1 Diagnosis and calibration system for ICP-MS apparatus Public/Granted day:2008-05-01
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