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US07871912B2 Methods of making semiconductor-based electronic devices by forming freestanding semiconductor structures 失效
通过形成独立的半导体结构制造基于半导体的电子器件的方法

  • Patent Title: Methods of making semiconductor-based electronic devices by forming freestanding semiconductor structures
  • Patent Title (中): 通过形成独立的半导体结构制造基于半导体的电子器件的方法
  • Application No.: US11610195
    Application Date: 2006-12-13
  • Publication No.: US07871912B2
    Publication Date: 2011-01-18
  • Inventor: Ajaykumar R. Jain
  • Applicant: Ajaykumar R. Jain
  • Applicant Address: US VT Shelbourne
  • Assignee: Versatilis LLC
  • Current Assignee: Versatilis LLC
  • Current Assignee Address: US VT Shelbourne
  • Agency: Downs Rachlin Martin PLLC
  • Main IPC: H01L21/44
  • IPC: H01L21/44
Methods of making semiconductor-based electronic devices by forming freestanding semiconductor structures
Abstract:
Various methods for forming active electronic devices, such as field-effect transistors, and devices made using these methods are disclosed. Some of the methods include growing freestanding nano-, micro- and milli-scale semiconducting structures that are used for the active semiconducting channels of the active electronic devices. Others of the methods include forming strands of active electronic devices along a wire. Yet others of the methods utilize both of these concepts so that the active electronic devices on a particular strand include freestanding semiconducting structures.
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