Invention Grant
- Patent Title: Sample relocation method in charged particle beam apparatus and charged particle beam apparatus as well as sample for transmission electron microscope
- Patent Title (中): 带电粒子束装置和带电粒子束装置的样品重定位方法以及透射电子显微镜样品
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Application No.: US12047022Application Date: 2008-03-12
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Publication No.: US07872231B2Publication Date: 2011-01-18
- Inventor: Junichi Tashiro , Masanao Munekane
- Applicant: Junichi Tashiro , Masanao Munekane
- Applicant Address: JP Chiba
- Assignee: Sll NanoTechnology Inc.
- Current Assignee: Sll NanoTechnology Inc.
- Current Assignee Address: JP Chiba
- Agency: Brinks Hofer Gilson & Lione
- Priority: JP2007-063551 20070313
- Main IPC: G01N23/00
- IPC: G01N23/00

Abstract:
In a chamber of a charged particle beam apparatus, the sample on the sample substrate is gripped and carried to the sample holder, and there is controlled the attitude of the sample when the sample is fixed on the sample holder. There possesses a marking process applying, in the chamber, a marking to a surface of the sample Wb existing on the sample substrate by a beam, a carriage process gripping the sample by a sample gripping means and carrying it from the sample substrate to the sample holder, and an attitude control process controlling, when fixing the sample to the sample holder, the attitude of the sample while observing the marking applied to the surface of the sample.
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