Invention Grant
US07872763B2 Device for measuring the position of at least one structure on a substrate
有权
用于测量衬底上至少一个结构的位置的装置
- Patent Title: Device for measuring the position of at least one structure on a substrate
- Patent Title (中): 用于测量衬底上至少一个结构的位置的装置
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Application No.: US12286466Application Date: 2008-09-30
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Publication No.: US07872763B2Publication Date: 2011-01-18
- Inventor: Katrin Pietsch , Klaus-Dieter Adam , Tillmann Ehrenberg
- Applicant: Katrin Pietsch , Klaus-Dieter Adam , Tillmann Ehrenberg
- Applicant Address: DE Weilburg
- Assignee: Vistec Semiconductor Systems GmbH
- Current Assignee: Vistec Semiconductor Systems GmbH
- Current Assignee Address: DE Weilburg
- Agency: Simpson & Simpson, PLLC
- Priority: DE102007000991 20071115
- Main IPC: G01B11/02
- IPC: G01B11/02 ; G01N21/01
Abstract:
A device for measuring the position of at least one structure on a substrate is disclosed. The substrate to be measured is positioned in a mirror body. A flat insert is provided in the mirror body and is formed such that the substrate and the insert together always have the same optical thickness, irrespective of the mechanical thickness of the substrate.
Public/Granted literature
- US20090128828A1 Device for measuring the position of at least one structure on a substrate Public/Granted day:2009-05-21
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