Invention Grant
US07873236B2 Systems, methods and apparatus for consistency-constrained filtered backprojection for out-of-focus artifacts in digital tomosythesis
有权
用于一致性约束的滤波反投影的系统，方法和装置，用于数字断层扫描中的离焦伪像
- Patent Title: Systems, methods and apparatus for consistency-constrained filtered backprojection for out-of-focus artifacts in digital tomosythesis
- Patent Title (中): 用于一致性约束的滤波反投影的系统，方法和装置，用于数字断层扫描中的离焦伪像
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Application No.: US11846009Application Date: 2007-08-28
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Publication No.: US07873236B2Publication Date: 2011-01-18
- Inventor: Baojun Li , Gopal B. Avinash
- Applicant: Baojun Li , Gopal B. Avinash
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agent William Baxter, Esq.; Michael G. Smith, Esq.
- Main IPC: G06K9/40
- IPC: G06K9/40
Abstract:
Systems, methods and apparatus are provided through which in some embodiments during backprojection of filtered two-dimensional into three dimensional image each voxel is analyzed for inconsistent contributions based on at least two criteria and each of the inconsistent contributions is either replaced or excluded from the backprojection.
Public/Granted literature
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