Invention Grant
- Patent Title: Integration structure of semiconductor circuit and microprobe sensing elements and method for fabricating the same
- Patent Title (中): 半导体电路和微探针感测元件的集成结构及其制造方法
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Application No.: US12382587Application Date: 2009-03-19
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Publication No.: US07875479B2Publication Date: 2011-01-25
- Inventor: Jin-Chern Chiou , Chih-Wei Chang
- Applicant: Jin-Chern Chiou , Chih-Wei Chang
- Applicant Address: TW Hsinchu
- Assignee: National Chiao Tung University
- Current Assignee: National Chiao Tung University
- Current Assignee Address: TW Hsinchu
- Agency: Rosenberg, Klein & Lee
- Priority: TW97117512A 20080513
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/48 ; H01L23/52

Abstract:
The present invention discloses an integration structure of a semiconductor circuit and microprobe sensing elements and a method for fabricating the same. In the method of the present invention, a semiconductor circuit is fabricated on one surface of a semiconductor substrate, and the other surface of the semiconductor substrate is etched to form a microprobe structure for detect physiological signals. Next, a deposition method is used to sequentially form an electrical isolated layer and an electrical conductive layer on the microprobes. Then, an electrical conductive material is used to electrically connect the electrical conductive layer with the electrical pads of the semiconductor circuit. Thus is achieved the integration of a semiconductor circuit and microprobe sensing elements in an identical semiconductor substrate with the problem of electric electrical isolated being solved simultaneously. Thereby, the voltage level detected by the microprobes will not interfere with the operation of the semiconductor circuit.
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