Invention Grant
- Patent Title: Passivation planarization
- Patent Title (中): 钝化平面化
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Application No.: US11717739Application Date: 2007-03-14
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Publication No.: US07875487B2Publication Date: 2011-01-25
- Inventor: Howard E. Rhodes
- Applicant: Howard E. Rhodes
- Applicant Address: US NY Mt. Kisco
- Assignee: Round Rock Research, LLC
- Current Assignee: Round Rock Research, LLC
- Current Assignee Address: US NY Mt. Kisco
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A pixel cell is formed by locating a first passivation layer over the final layer of metal lines. Subsequently, the uneven, non-uniform passivation layer is subjected to a planarization process such as chemical mechanical polishing, mechanical abrasion, or etching. A spin-on-glass layer may be deposited over the non-uniform passivation layer prior to planarization. Once a uniform, flat first passivation layer is achieved over the final metal, a second passivation layer, a color filter array, or a lens forming layer with uniform thickness is formed over the first passivation layer. The passivation layers can be oxide, nitride, a combination of oxide and nitride, or other suitable materials. The color filter array layer may also undergo a planarization process prior to formation of the lens forming layer. The present invention is also applicable to other devices.
Public/Granted literature
- US20070166854A1 Passivation planarization Public/Granted day:2007-07-19
Information query
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