Invention Grant
- Patent Title: Transparent positive electrode
- Patent Title (中): 透明正极
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Application No.: US10593288Application Date: 2005-04-28
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Publication No.: US07875896B2Publication Date: 2011-01-25
- Inventor: Munetaka Watanabe , Noritaka Muraki , Koji Kamei , Yasushi Ohno
- Applicant: Munetaka Watanabe , Noritaka Muraki , Koji Kamei , Yasushi Ohno
- Applicant Address: JP Tokyo
- Assignee: Showa Denko K.K.
- Current Assignee: Showa Denko K.K.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2004-134648 20040428
- International Application: PCT/JP2005/008561 WO 20050428
- International Announcement: WO2005/106983 WO 20051110
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
An object of the present invention is to provide a positive electrode having high transparency, low contact resistance and excellent current diffusibility and not requiring electron beam irradiation, high-temperature annealing or heat treatment, for alloying, in an oxygen atmosphere.The inventive transparent positive electrode for gallium nitride-based compound semiconductor light-emitting devices comprises a contact metal layer in contact with a p-type semiconductor layer, a current diffusing layer on the contact metal layer, the current diffusing layer having an electrical conductivity larger than that of the contact metal layer, and a bonding pad layer on the current diffusing layer.
Public/Granted literature
- US20070200129A1 Transparent Positive Electrode Public/Granted day:2007-08-30
Information query
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