Invention Grant
- Patent Title: Laser metrology system and method
- Patent Title (中): 激光测量系统及方法
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Application No.: US12138586Application Date: 2008-06-13
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Publication No.: US07876457B2Publication Date: 2011-01-25
- Inventor: Kurt D. Rueb
- Applicant: Kurt D. Rueb
- Applicant Address: BE Leuven
- Assignee: Nikon Metrology NV
- Current Assignee: Nikon Metrology NV
- Current Assignee Address: BE Leuven
- Agency: Howard & Howard Attorneys PLLC
- Main IPC: G01B11/14
- IPC: G01B11/14

Abstract:
A laser metrology system for determining a location of a target utilizes a laser projector having a laser source for projecting a laser beam. A rotating head directs the laser beam in a lateral direction. A sensor associated with the laser projector is capable of sensing the laser beam. A reflective target is configured to reflect the laser beam projector from the laser source toward the sensor in a manner indicative of the angle of the rotating head and the pulse of the laser beam to determine location of the target.
Public/Granted literature
- US20080309949A1 LASER METROLOGY SYSTEM AND METHOD Public/Granted day:2008-12-18
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