Invention Grant
- Patent Title: Motion sensor and method of manufacturing the same
- Patent Title (中): 运动传感器及其制造方法
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Application No.: US11737410Application Date: 2007-04-19
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Publication No.: US07878060B2Publication Date: 2011-02-01
- Inventor: Ryoichi Yoshikawa
- Applicant: Ryoichi Yoshikawa
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: SNR Denton US LLP
- Priority: JPP2006-118157 20060421
- Main IPC: G01P15/125
- IPC: G01P15/125 ; G01P9/04
Abstract:
A micromachine includes a movable section formed of a conductor and a support section formed of a conductor, wherein the movable section and the support section are separated from each other, an insulating layer is provided on the conductor, a conductive layer is provided on the insulating layer, and the conductive layer is formed so as to straddle the movable section and the support section.
Public/Granted literature
- US20080148849A1 MOTION SENSOR AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2008-06-26
Information query
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