Invention Grant
- Patent Title: Line-pattern formation method and line-pattern formation apparatus
- Patent Title (中): 线图案形成方法和线图案形成装置
-
Application No.: US11889433Application Date: 2007-08-13
-
Publication No.: US07878115B2Publication Date: 2011-02-01
- Inventor: Ayano Yamashita , Naoki Ozawa , Hiroyuki Urabe , Emiko Nakasato
- Applicant: Ayano Yamashita , Naoki Ozawa , Hiroyuki Urabe , Emiko Nakasato
- Applicant Address: JP Tokyo
- Assignee: Carl Manufacturing Co., Ltd.
- Current Assignee: Carl Manufacturing Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-223678 20060818
- Main IPC: B26F1/32
- IPC: B26F1/32 ; B26F1/14 ; B44C1/24

Abstract:
A line-pattern formation apparatus includes: a pattern former with a display defining a pattern and a referential projection indicating a reference position of the pattern; a positioning plate including a line-pattern indicator indicating a plurality of patterns in a lateral condition and a reference-positioning indicator specifying the reference position of the patterns; and a positioner including a stand on which a sheet is placed and a fixing member for fixing the sheet placed on the stand. The fixing member is provided with fitting portions for making the positioning plate detachably attached to the fixing member.
Public/Granted literature
- US20080041247A1 Line-pattern formation method and line-pattern formation apparatus Public/Granted day:2008-02-21
Information query
IPC分类: