Invention Grant
- Patent Title: Cooking apparatus with plasma cleaning
- Patent Title (中): 带等离子清洗的烹饪设备
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Application No.: US12342157Application Date: 2008-12-23
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Publication No.: US07878185B2Publication Date: 2011-02-01
- Inventor: Chan Bo Shim , Young Woo Lee , Yang Kyeong Kim , Yong Seog Jeon , Dae Kyung Kim
- Applicant: Chan Bo Shim , Young Woo Lee , Yang Kyeong Kim , Yong Seog Jeon , Dae Kyung Kim
- Applicant Address: KR Seoul
- Assignee: LG Electronics Inc.
- Current Assignee: LG Electronics Inc.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2008-0024184 20080317
- Main IPC: F24C15/00
- IPC: F24C15/00
Abstract:
A cooking apparatus includes a case in which a cooking chamber for cooking food is provided, a heating source provided in the case, a fan configured to circulate air in the cooking chamber; and a plasma discharger provided in the case and configured to generate plasma in order to remove residue from a surface of the case.
Public/Granted literature
- US20090229640A1 COOKING APPARATUS WITH PLASMA CLEANING Public/Granted day:2009-09-17
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