Invention Grant
- Patent Title: Substrate processing apparatus
- Patent Title (中): 基板加工装置
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Application No.: US11958996Application Date: 2007-12-18
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Publication No.: US07878213B2Publication Date: 2011-02-01
- Inventor: Ichiro Mitsuyoshi
- Applicant: Ichiro Mitsuyoshi
- Applicant Address: JP
- Assignee: Dainippon Screen Mfg. Co., Ltd.
- Current Assignee: Dainippon Screen Mfg. Co., Ltd.
- Current Assignee Address: JP
- Agency: Ostrolenk Faber LLP
- Priority: JP2006-351998 20061227
- Main IPC: B08B3/00
- IPC: B08B3/00

Abstract:
A reversing unit includes a fixed plate, a first movable plate provided so as to face one surface of the fixed plate, a second movable plate provided so as to face the other surface of the fixed plate and a rotary actuator. The rotary actuator rotates the first movable plate, the second movable plate and the fixed plate around a horizontal axis. A distance between the first movable plate and the fixed plate and a distance between the second movable plate and the fixed plate are set to be substantially equal to a difference in height between two hands of a main robot that carry a substrate in and out.
Public/Granted literature
- US20080156357A1 SUBSTRATE PROCESSING APPARATUS Public/Granted day:2008-07-03
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