Invention Grant
- Patent Title: Method of developing photosensitive material and method of producing conductive layer-attached film
- Patent Title (中): 感光材料的显影方法及导电层附着膜的制造方法
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Application No.: US12123588Application Date: 2008-05-20
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Publication No.: US07878722B2Publication Date: 2011-02-01
- Inventor: Toyomi Matsuda
- Applicant: Toyomi Matsuda
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Young & Thompson
- Priority: JP2007-134082 20070521
- Main IPC: G03D3/08
- IPC: G03D3/08

Abstract:
An in-liquid turn bar disposed in a developing tank is set to discharge developer from plural slit-shaped discharge openings of a first cylindrical member such that a discharge rate of the developer per 1 m of the photosensitive material turning member is from 50 to 200 l/min (litter/minute). Regulating plates protruding from a surface of the first cylindrical member are provided at both transverse ends of the first cylindrical member. The amount of the developer discharged from both transverse ends of a photosensitive web is controlled by the regulating plates, thereby adjusting a gap between the first cylindrical member and the photosensitive web. Accordingly, the gap between the photosensitive web and the in-liquid turn bar is substantially uniform in a transverse direction, and thus the photosensitive web is turned without contact with the in-liquid turn bar.
Public/Granted literature
- US20080292997A1 METHOD OF DEVELOPING PHOTOSENSITIVE MATERIAL AND METHOD OF PRODUCING CONDUCTIVE LAYER-ATTACHED FILM Public/Granted day:2008-11-27
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