Invention Grant
US07878722B2 Method of developing photosensitive material and method of producing conductive layer-attached film 有权
感光材料的显影方法及导电层附着膜的制造方法

  • Patent Title: Method of developing photosensitive material and method of producing conductive layer-attached film
  • Patent Title (中): 感光材料的显影方法及导电层附着膜的制造方法
  • Application No.: US12123588
    Application Date: 2008-05-20
  • Publication No.: US07878722B2
    Publication Date: 2011-02-01
  • Inventor: Toyomi Matsuda
  • Applicant: Toyomi Matsuda
  • Applicant Address: JP Tokyo
  • Assignee: Fujifilm Corporation
  • Current Assignee: Fujifilm Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Young & Thompson
  • Priority: JP2007-134082 20070521
  • Main IPC: G03D3/08
  • IPC: G03D3/08
Method of developing photosensitive material and method of producing conductive layer-attached film
Abstract:
An in-liquid turn bar disposed in a developing tank is set to discharge developer from plural slit-shaped discharge openings of a first cylindrical member such that a discharge rate of the developer per 1 m of the photosensitive material turning member is from 50 to 200 l/min (litter/minute). Regulating plates protruding from a surface of the first cylindrical member are provided at both transverse ends of the first cylindrical member. The amount of the developer discharged from both transverse ends of a photosensitive web is controlled by the regulating plates, thereby adjusting a gap between the first cylindrical member and the photosensitive web. Accordingly, the gap between the photosensitive web and the in-liquid turn bar is substantially uniform in a transverse direction, and thus the photosensitive web is turned without contact with the in-liquid turn bar.
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