Invention Grant
US07879100B2 Methods and systems for forming implants with selectively exposed mesh for fixation and related implants
有权
用于形成植入物的方法和系统,其具有用于固定和相关植入物的选择性暴露的网状物
- Patent Title: Methods and systems for forming implants with selectively exposed mesh for fixation and related implants
- Patent Title (中): 用于形成植入物的方法和系统,其具有用于固定和相关植入物的选择性暴露的网状物
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Application No.: US12016223Application Date: 2008-01-18
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Publication No.: US07879100B2Publication Date: 2011-02-01
- Inventor: Guilhem Denoziere , Daniel Tomko , Anish Ghodadra
- Applicant: Guilhem Denoziere , Daniel Tomko , Anish Ghodadra
- Applicant Address: US GA Marietta
- Assignee: SpineMedica, LLC
- Current Assignee: SpineMedica, LLC
- Current Assignee Address: US GA Marietta
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Main IPC: A61B17/70
- IPC: A61B17/70

Abstract:
Molded orthopaedic implants include at least one mesh substrate having opposing upper and lower primary surfaces. At least a major portion of the mesh substrate lower primary surface is integrally moldably attached to the molded implant body. The mesh substrate has at least one selectively exposed region devoid of molded material that exposes at least a portion of the mesh substrate upper surface to at least a partial thickness of the mesh substrate so as to allow for tissue in-growth in the at least one exposed region of the mesh substrate.
Public/Granted literature
- US20080174043A1 METHODS AND SYSTEMS FOR FORMING IMPLANTS WITH SELECTIVELY EXPOSED MESH FOR FIXATION AND RELATED IMPLANTS Public/Granted day:2008-07-24
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