Invention Grant
- Patent Title: Apparatus and method for cleaning nozzle
- Patent Title (中): 清洗喷嘴的设备及方法
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Application No.: US11472847Application Date: 2006-06-22
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Publication No.: US07879152B2Publication Date: 2011-02-01
- Inventor: Joong Mok Lee
- Applicant: Joong Mok Lee
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Brinks Hofer Gilson & Lione
- Priority: KR10-2005-0133113 20051229
- Main IPC: B08B9/00
- IPC: B08B9/00 ; B08B9/023 ; B08B3/10 ; B08B1/00

Abstract:
Disclosed are an apparatus and a method for cleaning a nozzle, which can automatically clean pollutant of the nozzle. The nozzle cleaning apparatus comprises the nozzle in a polluted state, a nozzle cleaning unit to clean a pollutant material from the nozzle by use of an absorbing member, and an absorbing member cleaning unit to clean a pollutant material from the absorbing member. With this configuration, the nozzle cleaning apparatus can clean the polluted nozzle by use of the absorbing member and in turn, can clean the polluted absorbing member by use of cleaning liquid, whereby automatic cleaning of the nozzle can be accomplished. Automatic cleaning of the polluted nozzle has the effect of reducing cleaning labor and time, and improving productivity.
Public/Granted literature
- US20070151577A1 Apparatus and method for cleaning nozzle Public/Granted day:2007-07-05
Information query
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