Invention Grant
US07879182B2 Shower plate, plasma processing apparatus, and product manufacturing method
失效
淋浴板，等离子体处理装置和产品制造方法
- Patent Title: Shower plate, plasma processing apparatus, and product manufacturing method
- Patent Title (中): 淋浴板，等离子体处理装置和产品制造方法
-
Application No.: US10584340Application Date: 2004-09-24
-
Publication No.: US07879182B2Publication Date: 2011-02-01
- Inventor: Tadahiro Ohmi , Masaki Hirayama , Tetsuya Goto
- Applicant: Tadahiro Ohmi , Masaki Hirayama , Tetsuya Goto
- Applicant Address: JP Ibaraki
- Assignee: Foundation for Advancement of International Science
- Current Assignee: Foundation for Advancement of International Science
- Current Assignee Address: JP Ibaraki
- Agency: Foley & Lardner LLP
- Priority: JP2003-434769 20031226
- International Application: PCT/JP2004/014421 WO 20040924
- International Announcement: WO2005/067022 WO 20050721
- Main IPC: C23F1/00
- IPC: C23F1/00 ; H01L21/306 ; C23C16/00
Abstract:
A system for processing a substrate uniformly by increasing the number of gas discharge holes being arranged per unit area of a shower plate as receding from the center of the shower plate or increasing the radii of the gas discharge holes as receding from the center of the shower plate thereby making the plasma excitation gas flow uniform.
Public/Granted literature
- US20070144671A1 Shower plate, plasma processing apparatus, and product manufacturing method Public/Granted day:2007-06-28
Information query
