Invention Grant
US07879209B2 Cathode for sputter coating 有权
溅射镀膜阴极

Cathode for sputter coating
Abstract:
A magnetron sputtering cathode for use in a vacuum deposition process is disclosed wherein the cathode is coated on its sides with an electrically insulating material such as alumina to prevent arcing, and wherein the first end surface of the cathode supports a material to be sputtered. The bottom of the cathode may also be coated with an electrically insulating coating or may be resting upon an insulating platform.
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