Invention Grant
- Patent Title: Organic vapor jet deposition using an exhaust
- Patent Title (中): 使用排气的有机蒸气喷射沉积
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Application No.: US11643795Application Date: 2006-12-22
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Publication No.: US07879401B2Publication Date: 2011-02-01
- Inventor: Stephen Forrest , Richard Lunt
- Applicant: Stephen Forrest , Richard Lunt
- Applicant Address: US MI Ann Arbor US NJ Princeton
- Assignee: The Regents of the University of Michigan,The Trustees of Princeton University
- Current Assignee: The Regents of the University of Michigan,The Trustees of Princeton University
- Current Assignee Address: US MI Ann Arbor US NJ Princeton
- Agency: Townsend and Townsend and Crew LLP
- Main IPC: C23C16/455
- IPC: C23C16/455

Abstract:
Methods and systems for organic vapor jet deposition are provided, where an exhaust is disposed between adjacent nozzles. One or more carrier gases may be provided and ejected from a plurality of nozzles. An exhaust may be provided to create a localized vacuum between nozzles. The exhaust may reduce pressure buildup in the nozzles and between the nozzles and the substrate, leading to improved deposition profiles, resolution, and improved nozzle-to-nozzle uniformity. The exhaust may be in fluid communication with an ambient vacuum, or may be directly connected to a vacuum source.
Public/Granted literature
- US20080152806A1 Organic vapor jet deposition using an exhaust Public/Granted day:2008-06-26
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