Invention Grant
- Patent Title: Method of fabricating an electrochemical device using ultrafast pulsed laser deposition
- Patent Title (中): 使用超快脉冲激光沉积制造电化学装置的方法
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Application No.: US10863362Application Date: 2004-06-09
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Publication No.: US07879410B2Publication Date: 2011-02-01
- Inventor: Yong Che , Zhendong Hu
- Applicant: Yong Che , Zhendong Hu
- Applicant Address: US MI Ann Arbor
- Assignee: Imra America, Inc.
- Current Assignee: Imra America, Inc.
- Current Assignee Address: US MI Ann Arbor
- Agency: Buchanan Ingersoll & Rooney PC
- Main IPC: H05H1/24
- IPC: H05H1/24
Abstract:
A method of fabricating a multi-layered thin film electrochemical device is provided. The method comprises: providing a first target material in a chamber; providing a substrate in the chamber; emitting a first intermittent laser beam directed at the first target material to generate a first plasma, wherein each pulse of the first intermittent laser beam has a pulse duration of about 20 fs to about 500 ps; depositing the first plasma on the substrate to form a first thin film; providing a second target material in the chamber; emitting a second intermittent laser beam directed at the second target material to generate a second plasma, wherein each pulse of the second intermittent laser beam has a pulse duration of about 20 fs to about 500 ps; and depositing the second plasma on or above the first thin film to form a second thin film.
Public/Granted literature
- US20050276931A1 Method of fabricating an electrochemical device using ultrafast pulsed laser deposition Public/Granted day:2005-12-15
Information query
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