Invention Grant
- Patent Title: Method of manufacturing nonvolatile storage device
- Patent Title (中): 制造非易失性存储装置的方法
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Application No.: US12554319Application Date: 2009-09-04
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Publication No.: US07879670B2Publication Date: 2011-02-01
- Inventor: Hiroyuki Nansei , Toshiharu Tanaka , Hirokazu Kikuchi
- Applicant: Hiroyuki Nansei , Toshiharu Tanaka , Hirokazu Kikuchi
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-095071 20090409
- Main IPC: H01L21/8244
- IPC: H01L21/8244

Abstract:
A method of manufacturing a nonvolatile storage device having memory cell arrays according to an embodiment of the present invention includes forming, in a memory cell array forming region above a processed film, first columnar members arrayed at substantially equal intervals in the first direction and the second direction, forming, concerning at least arrays as a part of arrays of the first columnar members in the first direction, second columnar members long in section having major axes longer than sections of the first columnar members outside of the memory cell array forming region such that the major axes are set in the first direction and the second columnar members continue to ends of the arrays, and forming, in the same manner as above, third columnar members, which continue to arrays of the first columnar members in the second direction.
Public/Granted literature
- US20100261330A1 METHOD OF MANUFACTURING NONVOLATILE STORAGE DEVICE Public/Granted day:2010-10-14
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