Invention Grant
- Patent Title: Marker structure and method for controlling alignment of layers of a multi-layered substrate
- Patent Title (中): 用于控制多层基板的层的对准的标记结构和方法
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Application No.: US12611428Application Date: 2009-11-03
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Publication No.: US07879682B2Publication Date: 2011-02-01
- Inventor: Richard Johannes Franciscus Van Haren , Arie Jeffrey Den Boef , Jacobus Burghoorn , Maurits Van Der Schaar , Bart Rijpers
- Applicant: Richard Johannes Franciscus Van Haren , Arie Jeffrey Den Boef , Jacobus Burghoorn , Maurits Van Der Schaar , Bart Rijpers
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: H01L21/76
- IPC: H01L21/76 ; H01L21/78 ; H01L21/46 ; H01L23/544 ; G01B11/00
Abstract:
The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.
Public/Granted literature
- US20100068830A1 MARKER STRUCTURE AND METHOD FOR CONTROLLING ALIGNMENT OF LAYERS OF A MULTI-LAYERED SUBSTRATE Public/Granted day:2010-03-18
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