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US07879700B2 Crystallization apparatus and method of amorphous silicon 有权
非晶硅结晶装置及方法

Crystallization apparatus and method of amorphous silicon
Abstract:
A silicon crystallization system includes a beam generator generating a laser beam, first and second optical units for controlling the laser beam from the beam generator; and a stage for mounting a panel including an amorphous silicon layer to be polycrystallized by the laser beam from the optical units. The first optical unit makes the laser beam have a transverse edge and a longitudinal edge longer than the transverse edge, and the second optical unit makes the laser beam have a transverse edge and a longitudinal edge shorter than the transverse edge.
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