Invention Grant
- Patent Title: Crystallization apparatus and method of amorphous silicon
- Patent Title (中): 非晶硅结晶装置及方法
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Application No.: US10547070Application Date: 2004-02-24
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Publication No.: US07879700B2Publication Date: 2011-02-01
- Inventor: Ui-Jin Chung , Dong-Byum Kim , Su-Gyeong Lee , Myung-Koo Kang , Hyun-Jae Kim
- Applicant: Ui-Jin Chung , Dong-Byum Kim , Su-Gyeong Lee , Myung-Koo Kang , Hyun-Jae Kim
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Innovation Counsel LLP
- Priority: KR10-2003-0011643 20030225
- International Application: PCT/KR2004/000382 WO 20040224
- International Announcement: WO2004/077544 WO 20040910
- Main IPC: H01L21/322
- IPC: H01L21/322 ; H01L21/428

Abstract:
A silicon crystallization system includes a beam generator generating a laser beam, first and second optical units for controlling the laser beam from the beam generator; and a stage for mounting a panel including an amorphous silicon layer to be polycrystallized by the laser beam from the optical units. The first optical unit makes the laser beam have a transverse edge and a longitudinal edge longer than the transverse edge, and the second optical unit makes the laser beam have a transverse edge and a longitudinal edge shorter than the transverse edge.
Public/Granted literature
- US20060148165A1 Crystallization apparatus and method of amorphous silicon Public/Granted day:2006-07-06
Information query
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