Invention Grant
- Patent Title: Charge trapping dielectric structure for non-volatile memory
- Patent Title (中): 用于非易失性存储器的电荷捕获电介质结构
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Application No.: US11466079Application Date: 2006-08-21
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Publication No.: US07879738B2Publication Date: 2011-02-01
- Inventor: Szu Yu Wang
- Applicant: Szu Yu Wang
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Kenta Suzue
- Main IPC: H01L21/469
- IPC: H01L21/469

Abstract:
An integrated circuit structure comprises a bottom dielectric layer on a substrate, a middle dielectric layer, and a top dielectric layer. The middle dielectric layer has a top surface and a bottom surface, and comprises a plurality of materials. Respective concentration profiles for at least two of the plurality of materials between the top and bottom surfaces are non-uniform and arranged to induce a variation in energy gap between the top and bottom surfaces. The variation in energy gap establishes an electric field between the top and bottom surfaces tending to oppose charge motion toward at least one of the top and bottom surfaces and prevent resultant charge leakage.
Public/Granted literature
- US20060281331A1 CHARGE TRAPPING DIELECTRIC STRUCTURE FOR NON-VOLATILE MEMORY Public/Granted day:2006-12-14
Information query
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