Invention Grant
- Patent Title: Cleaning compositions for hard to remove organic material
- Patent Title (中): 清洁组合物难以去除有机物质
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Application No.: US12802017Application Date: 2010-05-27
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Publication No.: US07879787B2Publication Date: 2011-02-01
- Inventor: Stavroula Maria Heintz , Shannon K. Campbell , Gurusamy Manivannan
- Applicant: Stavroula Maria Heintz , Shannon K. Campbell , Gurusamy Manivannan
- Applicant Address: US OH Mentor
- Assignee: American Sterilizer Company
- Current Assignee: American Sterilizer Company
- Current Assignee Address: US OH Mentor
- Agency: Hudak, Shunk & Farine Co. LPA
- Main IPC: C11D1/66
- IPC: C11D1/66 ; C11D1/70 ; C11D1/86 ; C11D3/39 ; C11D3/395

Abstract:
An oxidizing cleaning composition comprises a low concentration of aqueous hydrogen peroxide that is environmentally friendly and has good stability in strong alkaline solutions. The aqueous hydrogen peroxide composition contains a synergistic combination of one or more hydrophilic surfactants having an HLB of 10 or greater, one or more hydrotropes, one or more UV-analyzable surfactants having an aromatic detectable functional group, and optionally a surfactant having an HLB of less than 10. The cleaning composition when mixed with an alkaline compound is very effective in removing dried or baked residues of polymers, modified or natural celluloses starches, natural gels, and the like at low concentrations and temperatures.
Public/Granted literature
- US20100236582A1 Cleaning compositions for hard to remove organic material Public/Granted day:2010-09-23
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