Invention Grant
- Patent Title: Production of carbonyl fluoride
- Patent Title (中): 生产碳酰氟
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Application No.: US10591783Application Date: 2005-02-09
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Publication No.: US07880039B2Publication Date: 2011-02-01
- Inventor: Max Braun , Johannes Eicher
- Applicant: Max Braun , Johannes Eicher
- Applicant Address: DE Hannover
- Assignee: Solvay Fluor GmbH
- Current Assignee: Solvay Fluor GmbH
- Current Assignee Address: DE Hannover
- Agency: Connolly Bove Lodge & Hutz LLP
- Priority: EP04005421 20040308
- International Application: PCT/EP2005/001281 WO 20050209
- International Announcement: WO2005/085129 WO 20050915
- Main IPC: C07C19/08
- IPC: C07C19/08 ; C07C21/18 ; C07C51/58
Abstract:
Carbonyl fluoride, which can also be used as an etching gas, can be prepared by photochemical oxidation of chlorodifluoromethane or trifluoromethane with light, for example with light of a wavelength ≧280 nm in the presence of chlorine.
Public/Granted literature
- US20070197826A1 Production of carbonyl fluoride Public/Granted day:2007-08-23
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