Invention Grant
- Patent Title: Dual gap thermo-tunneling apparatus and methods
- Patent Title (中): 双间隙热隧道装置及方法
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Application No.: US11192638Application Date: 2005-07-29
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Publication No.: US07880079B2Publication Date: 2011-02-01
- Inventor: Minas H. Tanielian
- Applicant: Minas H. Tanielian
- Applicant Address: US IL Chicago
- Assignee: The Boeing Company
- Current Assignee: The Boeing Company
- Current Assignee Address: US IL Chicago
- Main IPC: H01L35/30
- IPC: H01L35/30 ; H02N10/00

Abstract:
Method and apparatus for improved thermal isolation for thermoelectric devices are disclosed. In one embodiment, a thermoelectric device includes a first substrate portion having a first p-type conductive portion electrically coupled to a first n-type conductive portion, and a second substrate portion having a second p-type conductive portion and a second n-type conductive portion, the second substrate portion being positioned proximate to the first substrate portion such that the first and second p-type conductive portions are approximately aligned and the first and second n-type conductive portions are approximately aligned, wherein the first and second p-type conductive portions are spaced apart to form a first gap, and the first and second n-type conductive portions are spaced apart to form a second gap.
Public/Granted literature
- US20070023077A1 Dual gap thermo-tunneling apparatus and methods Public/Granted day:2007-02-01
Information query
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