Invention Grant
- Patent Title: Fast recovery reduced p-n junction rectifier
- Patent Title (中): 快速恢复降低p-n结整流器
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Application No.: US11801023Application Date: 2007-05-08
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Publication No.: US07880166B2Publication Date: 2011-02-01
- Inventor: Ho-Yuan Yu
- Applicant: Ho-Yuan Yu
- Applicant Address: US CA Saratoga
- Assignee: Ho-Yuan Yu
- Current Assignee: Ho-Yuan Yu
- Current Assignee Address: US CA Saratoga
- Agency: Cheng Intellectual Property Group
- Main IPC: H01L29/10
- IPC: H01L29/10

Abstract:
A fast recovery rectifier structure with the combination of Schottky structure to relieve the minority carriers during the forward bias condition for the further reduction of the reverse recovery time during switching in addition to the lifetime killer such as Pt, Au, and/or irradiation. This fast recovery rectifier uses unpolished substrates and thick impurity diffusion for low cost production. A reduced p-n junction structure with a heavily doped film is provided to terminate and shorten the p-n junction space charge region. This reduced p-n junction with less total charge in the p-n junction to further improve the reverse recovery time. This reduced p-n junction can be used alone, with the traditional lifetime killer method, with the Schottky structure and/or with the epitaxial substrate.
Public/Granted literature
- US20070262304A1 Fast recovery rectifier Public/Granted day:2007-11-15
Information query
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