Invention Grant
- Patent Title: Integrated circuit arrangement comprising isolating trenches and a field effect transistor
- Patent Title (中): 集成电路装置,包括隔离沟槽和场效应晶体管
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Application No.: US11273618Application Date: 2005-11-14
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Publication No.: US07880264B2Publication Date: 2011-02-01
- Inventor: Ronald Kakoschke , Franz Schuler
- Applicant: Ronald Kakoschke , Franz Schuler
- Applicant Address: DE Munich
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Munich
- Agency: Brinks Hofer Gilson & Lione
- Priority: DE10321742 20030514
- Main IPC: H01L27/115
- IPC: H01L27/115

Abstract:
A memory circuit arrangement and a fabrication method are disclosed. The memory circuit arrangement has a memory cell area. The memory cell area contains memory cell transistors, one column of which are selected using a triple gate area selection transistor. The transistor has gate area that extends into isolating trenches. The isolating trenches isolate the memory cell in different columns of the memory cell array.
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